Thermal annealing of laser damage precursors on fused silica surfaces
نویسندگان
چکیده
منابع مشابه
Arresting UV-Laser Damage in Fused Silica
26 LLE Review, Volume 77 Deciding when to replace spot-damage-afflicted fused-silica optics or, in the case of inaccessible, space-based lasers, predicting the useful service life of fused-silica optics before catastrophic, pulsed-laser-driven crack growth shatters a part has recently become simpler. By empirically deriving a rule for laser-driven crack growth in fused silica as a function of t...
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Theoretical models for heating, evaporation, material flow, and stress and strain generation accompanying CO2 laser damage mitigation and surface treatment of fused silica are developed to aid understanding of scaling with process parameters. We find that lateral nonlinear heat transport is an important cooling mechanism, more significant than evaporative cooling. Scaling laws relating experime...
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CO(2) laser is an interesting tool to repair defects on silica optics. We studied UV nanosecond laser-induced damage in fused silica after CO(2) laser heating. The localization of damage sites and the laser damage threshold are closely related to stress area in silica induced by heating. By applying a suitable second laser heating, we managed to eliminate the debris issued from redeposited sili...
متن کاملFemtosecond laser micromachining of fused silica molds.
The use of low-energy femtosecond laser beam combined with chemical etching has been proven to be an efficient method to fabricate three-dimensional structures in fused silica. For high-volume application, this technology--like other serial processes--suffers from a moderate production rate. Here, we show that femtosecond laser can also be employed to fabricate silica molds and other patterned ...
متن کاملDepth Profiling of Polishing-Induced Contamination on Fused Silica Surfaces
Laser-induced damage on optical surfaces is often associated with absorbing contaminants introduced by the polishing process. This is particularly the case for W optics. In the present study, secondmy ion mass spectroscopy (SIMS) was used to measure depth profiles of finishing-process contamination on fused silica surfaces. Contaminants detected include the major polishing compound components (...
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ژورنال
عنوان ژورنال: Optical Engineering
سال: 2012
ISSN: 0091-3286
DOI: 10.1117/1.oe.51.12.121817